MA8 Gen5 Mask Aligner

Compact Aligner Platform for Research and Mid- to Large Scale Production

The MA8 Gen5 represents the latest generation of SUSS MicroTec’s semi-automated mask and bond aligner. The new platform introduces improved imprint processing features for standard, advanced and high-end processes.

The MA8 Gen5 offers an enhanced ergonomic and user-friendly design, cost efficiency and a reduced footprint, and is the perfect tool for use in research and mid- to large-scale production.

SUSS MicroTec’s MA8 Gen5 is setting a new benchmark in full-field lithography for MEMS & NEMS, 3D integration and compound semiconductor markets, especially for a large variety of imprint applications in the field of LED, MEMS/NEMS, micro-optics, augmented reality and opto-electronic sensors using the renowned SMILE technology. It is also able to handle processes such as bond alignment and fusion bonding.

Highlights

  • Enhanced SUSS leveling system
  • One tool covering micro- to nano imprinting
  • Outstanding process results
  • User friendliness
  • Low cost of ownership
  • Small footprint and enhanced ergonomics
MA8 Gen5 Mask Aligner

Ideal process results through precision

The high degree of automation of the MA8 Gen5 enables outstanding process results. Functions such as constant dose mode, an automated control unit for exposure time and auto-alignment all help optimize process parameters. Additionally, equipped with the high-grade MO Exposure Optics system, the MA8 Gen5 provides ideal exposure conditions and thus achieves top-class results. Sophisticated mechanical workings ensure high adjustment precision: the particular design of the top- and bottom-side microscope unit (TSA and BSA) eliminates long travel for the TSA microscope, as well as the disturbing vibrations. It supports several imprint processes for micro- and nanostructures. With only a little adjustment, it allows wafer-to-wafer alignment, as well as easy fusion bonding.

High operating comfort

Functions such as a highly intuitive recipe editor, sophisticated data logging and the ability to assign user rights simplify the user’s work and simultaneously minimize the need for operator intervention. The MA Gen5 platform also makes use of high-grade digital microscopes and cameras, which significantly simplify the alignment process thanks to enhanced image quality and an extended field of view on the monitor.

Work safety and environmental protection

The MA8 Gen5 is equipped with an energy-efficient LED light source and sophisticated exposure optics for all lithography processes. In addition, a dedicated UV-LED flood exposure unit is available for imprint applications. The UV-LED light source not only reduces operating and maintenance costs, but improves work safety and environmental protection as well. This eliminates the expensive and hazardous waste disposal of mercury lamps. The machine offers further security features, such as UV radiation protection, safety interlocks and trap protection, thus fulfilling strict safety requirements. Optionally, configuration with a mercury light source is possible as well.

Cost-effectiveness

With its compact design, the MA8 Gen5 offers a wide variety of processes despite a reduced footprint, which is a major factor in the attractive cost of ownership, saving costly cleanroom space. Maintenance effort is reduced by the accessibility of the operating elements and exchangeable parts, as well as use of the LED light source and the renowned SUSS MO Exposure Optics. In the event of an error or failure, the machine can be accessed by SUSS MicroTec service staff remotely, so that the issue can be resolved in a quick and cost-effective manner.

Details : Alignment

  • Top-side alignment (TSA)
  • Bottom-side alignment (BSA)
  • Infrared alignment (IR)
  • DirectAlign®

Details : Exposure

  • Proximity Lithography
  • Soft Contact Exposure
  • Hard Contact Exposure
  • Vacuum Contact Exposure

Details : Exposure Optics

  • MO Exposure Optics®
  • Diffraction-Reducing Optics

Details : Automation

  • Auto Alignment
  • SUSS Leveling System

Exposure

  • Lab Simulation Software
  • Source Mask Optimization
  • UV-LED Light Source

Nanoimprint Lithography

  • Imprint Lithography
  • SMILE
  • Stamp Fabrication

Bonding

  • UV Bonding
  • Bond Alignment
  • Fusion Bonding